Glow Discharge Atomic Emission Spectrometer
Glow Discharge Spectrometry utilizes a low-pressure, non-thermal process in which material is uniformly sputtered from the sample surface by a stream of argon ions.

The sputtered material is then atomized and excited in a low-pressure plasma discharge, away from the sample surface. The GDS850 focuses this technology to enhance your lab’s performance for both process control and research/development investigations. It delivers highly accurate bulk analysis as well as compositional depth profiling for coatings analysis and surface treatments. This instrument offers a spectral range from 120 to 800 nm and may be configured with up to 58 channels.


  • Separation of sputtering and excitation
  • Linear calibration curves with wide dynamic range
  • Lowered self-absorption and material re-deposition
  • Excitation of almost exclusively atom lines
  • Fewer and narrower emission lines reduce interference
  • Freedom from metallurgical history
  • Fewer standards required for calibration
  • Low argon gas consumption
  • Automatic cleaning between samples

Uniform Sputtering

Other methods may preferentially attack the sample surface and do not always provide a representative sample to analyze. With glow discharge, sample material is uniformly sputtered from the surface. The nonthermal nature of the sampling process makes this an excellent technique for difficult applications. GDS850 Surface Plot



  • GDS850A



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