Description
- Separation of sputtering and excitation
- Linear calibration curves with wide dynamic range
- Lowered self-absorption and material re-deposition
- Excitation of almost exclusively atom lines
- Fewer and narrower emission lines reduce interference
- Freedom from metallurgical history
- Fewer standards required for calibration
- Low argon gas consumption
- Automatic cleaning between samples
Uniform Sputtering
| Other methods may preferentially attack the sample surface and do not always provide a representative sample to analyze. With glow discharge, sample material is uniformly sputtered from the surface. The nonthermal nature of the sampling process makes this an excellent technique for difficult applications. |  |
Models
- GDS850A
Options
- RF Source
- Statistical Software Package
- Lamp Assembly Kits
- Sample Holders
- SmartLine® Remote Diagnostics
- GDS850 Reference Card
- GDS850 Brochure
- Article: Glow Discharge – A Modern Concept for Coatings Analysis
- Preparation of Specimens for Bulk Analysis using LECO GDS (-031)
- GD-AES and its Performance in Accordance with ASTM E415 (-030)
- GD-AES and its Performance in Accordance with ASTM E1009 (-044)
- Pseudo Elements: Use, Format, Example, Explanation and Discussion (-039)
- Understanding Calibration for GDS-AES (-041)
- Understanding the Glow Discharge Source (-035)
- QDP Analysis of Aluminum Clad (-028)
- QDP Analysis of Aluminized Steel (-040)
- QDP Analysis of Carburized Steel (-036)
- QDP Analysis of Elastomer Bonded Steel Sandwich (-034)
- QDP Analysis of Iron Phosphate on Steel (-043)
- QDP Analysis of Galvanized Steel (-027)
- QDP Analysis of Plated Samples (-024)
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